Semiconductor Manufacturing
For Semiconductor Manufacturing, cfr subpart is 40 CFR 63 Subpart BBBBB; source type is major sources; original final rule date is 2003-05-22; most recent amendment date is 2008-07-22; rtr status is not stated, recorded from its source on 2026-09-29.
- source category
- Semiconductor Manufacturing
- cfr subpart
- 40 CFR 63 Subpart BBBBB
- source type
- major sources our reading
- original final rule date
- 2003-05-22
- most recent amendment date
- 2008-07-22
- rtr status
- not stated our reading
- key haps regulated
- but are not limited to, five chemicals that comprise over 90 percent of the total HAP emissions: hydrochloric acid (HCl), hydrogen fluoride (HF), glycol ethers, methanol, and xylene verified
- epa category url
- https://www.epa.gov/stationary-sources-air-pollution/semiconductor-manufacturing-national-emission-standards-hazardous our reading
Values marked our reading are our classification of what the source says — the source does not print them in those words. The quote below is the evidence for each one; judge it yourself.
What the source says
The source category includes all manufacturing from crystal growth through wafer fabrication, and test and assembly. The primary hazardous air pollutants that are controlled by this rule include but are not limited to, five chemicals that comprise over 90 percent of the total HAP emissions: hydrochloric acid (HCl), hydrogen fluoride (HF), glycol ethers, methanol, and xylene.
— epa.gov, retrieved 2026-09-29
Source
- epa.govhttps://www.epa.gov/stationary-sources-air-pollution/semiconductor-manufacturing-national-emission-standards-hazardous