ISO 14701:2011
For ISO 14701:2011, item title is Surface chemical analysis — X-ray photoelectron spectroscopy — Measurement of silicon oxide thickness; status code is 9599; successor is ISO 14701:2018; withdrawn / published date is 2011-08-02, recorded from its source on 2026-08-05.
- Identifier
- ISO 14701:2011 verified
- Item title
- Surface chemical analysis — X-ray photoelectron spectroscopy — Measurement of silicon oxide thickness verified
- Status code
- 9599 verified
- Successor
- ISO 14701:2018
- Withdrawn / published date
- 2011-08-02 verified
Verified
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What the source says
54929,IS,,ISO 14701:2011,Surface chemical analysis — X-ray photoelectron spectroscopy — Measurement of silicon oxide thickness,Analyse chimique des surfaces — Spectroscopie de photoélectrons par rayons X — Mesurage de l'épaisseur d'oxyde de silicium,2011-08-02,1,['71.040.40'],ISO/TC 201/SC 7,9599,,[74818],['en'],15,"<p>ISO 14701:2011 specifies several methods for measuring the oxide thickness at the surfaces of (100) and (111) silicon wafers as an equivalent thickness of silicon dioxide when measured using X-ray photoelectron spectroscopy. It is only applicable to flat, polished specimens and for instruments that incorporate an Al or Mg X-ray source, a specimen stage that permits defined pho
— isopublicstorageprod.blob.core.windows.net, retrieved 2026-08-05
Source
- isopublicstorageprod.blob.core.windows.nethttps://isopublicstorageprod.blob.core.windows.net/opendata/_latest/iso_deliverables_metadata/csv/iso_deliverables_metadata.csv