# ISO 14701:2011 — Withdrawn and superseded ISO standards

For ISO 14701:2011, item title is Surface chemical analysis — X-ray photoelectron spectroscopy — Measurement of silicon oxide thickness; status code is 9599; successor is ISO 14701:2018; withdrawn / published date is 2011-08-02, recorded from its source on 2026-08-05.

- **Identifier:** ISO 14701:2011 _(verified: appears in the quote below)_
- **Item title:** Surface chemical analysis — X-ray photoelectron spectroscopy — Measurement of silicon oxide thickness _(verified: appears in the quote below)_
- **Status code:** 9599 _(verified: appears in the quote below)_
- **Successor:** ISO 14701:2018
- **Withdrawn / published date:** 2011-08-02 _(verified: appears in the quote below)_

## What the source says

> 54929,IS,,ISO 14701:2011,Surface chemical analysis — X-ray photoelectron spectroscopy — Measurement of silicon oxide thickness,Analyse chimique des surfaces — Spectroscopie de photoélectrons par rayons X — Mesurage de l'épaisseur d'oxyde de silicium,2011-08-02,1,['71.040.40'],ISO/TC 201/SC 7,9599,,[74818],['en'],15,"<p>ISO 14701:2011 specifies several methods for measuring the oxide thickness at the surfaces of (100) and (111) silicon wafers as an equivalent thickness of silicon dioxide when measured using X-ray photoelectron spectroscopy. It is only applicable to flat, polished specimens and for instruments that incorporate an Al or Mg X-ray source, a specimen stage that permits defined pho

## Source

- https://isopublicstorageprod.blob.core.windows.net/opendata/_latest/iso_deliverables_metadata/csv/iso_deliverables_metadata.csv

Last verified: 2026-08-05. Review by: 2027-02-01.
Part of [Withdrawn and superseded ISO standards](https://referencesource.org/iso-standard-supersessions/).