ISO 17109:2015
For ISO 17109:2015, item title is Surface chemical analysis — Depth profiling — Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films; status code is 9599; successor is ISO 17109:2022; withdrawn / published date is 2015-07-28, recorded from its source on 2026-08-05.
- Identifier
- ISO 17109:2015 verified
- Item title
- Surface chemical analysis — Depth profiling — Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films verified
- Status code
- 9599 verified
- Successor
- ISO 17109:2022
- Withdrawn / published date
- 2015-07-28 verified
Verified
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What the source says
61443,IS,,ISO 17109:2015,"Surface chemical analysis — Depth profiling — Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films","Analyse chimique des surfaces — Profilage d'épaisseur — Méthode pour la détermination de la vitesse de pulvérisation lors du profilage d'épaisseur par pulvérisation en spectroscopie de photoélectrons par rayons X, spectroscopie d'électrons Auger et spectrométrie de masse des ions secondaires à l'aide de films minces multicouches",2015-07-28,1,['71.040.40'],ISO/TC 201/SC 4,9599,,[83666],['en'],16,"<p>ISO 17109:2015 speci
— isopublicstorageprod.blob.core.windows.net, retrieved 2026-08-05
Source
- isopublicstorageprod.blob.core.windows.nethttps://isopublicstorageprod.blob.core.windows.net/opendata/_latest/iso_deliverables_metadata/csv/iso_deliverables_metadata.csv